ISO/TR 22335-2007 表面化学分析.深度剖面.溅射速率测量:使用机械光针式轮廓仪的网眼复制法
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【英文标准名称】:Surfacechemicalanalysis-Depthprofiling-Measurementofsputteringrate:mesh-replicamethodusingamechanicalstylusprofilometer
【原文标准名称】:表面化学分析.深度剖面.溅射速率测量:使用机械光针式轮廓仪的网眼复制法
【标准号】:ISO/TR22335-2007
【标准状态】:现行
【国别】:国际
【发布日期】:2007-07-01
【实施或试行日期】:
【发布单位】:国际标准化组织(IX-ISO)
【起草单位】:ISO/TC201
【标准类型】:()
【标准水平】:()
【中文主题词】:螺旋电子光谱法;化学分析和测试;定义;深度测量;深度剖面;精整;定量分析;光谱学;溅射;表面化学;表面;X射线光度法
【英文主题词】:Augerelectronspectroscopy;Chemicalanalysisandtesting;Definition;Definitions;Depthmeasurement;Depthprofile;Finishes;Quantitativeanalysis;Spectroscopy;Sputtering;Surfacechemistry;Surfaces;X-rayspectrometry
【摘要】:ThisTechnicalReportdescribesamethodfordeterminingion-sputteringratesfordepthprofilingmeasurementswithAugerelectronspectroscopy(AES)andX-rayphotoelectronspectroscopy(XPS)wherethespecimenision-sputteredoveraregionwithanareabetween0,4mm2and3,0mm2.ThisTechnicalReportisapplicableonlytoalaterallyhomogeneousbulkorsingle-layeredmaterialwheretheion-sputteringrateisdeterminedfromthesputtereddepth,asmeasuredbyamechanicalstylusprofilometer,andsputteringtime.ThisTechnicalReportprovidesamethodtoconverttheion-sputteringtimescaletosputtereddepthinadepthprofilebyassumingaconstantsputteringvelocity.Thismethodhasnotbeendesignedfor,ortestedusing,ascanningprobemicroscopesystem.Itisnotapplicabletothecasewherethesputteredareaislessthan0,4mm2orwherethesputter-inducedsurfaceroughnessissignificantcomparedwiththesputtereddepthtobemeasured
【中国标准分类号】:A43
【国际标准分类号】:71_040_40
【页数】:24P.;A4
【正文语种】:英语
【原文标准名称】:表面化学分析.深度剖面.溅射速率测量:使用机械光针式轮廓仪的网眼复制法
【标准号】:ISO/TR22335-2007
【标准状态】:现行
【国别】:国际
【发布日期】:2007-07-01
【实施或试行日期】:
【发布单位】:国际标准化组织(IX-ISO)
【起草单位】:ISO/TC201
【标准类型】:()
【标准水平】:()
【中文主题词】:螺旋电子光谱法;化学分析和测试;定义;深度测量;深度剖面;精整;定量分析;光谱学;溅射;表面化学;表面;X射线光度法
【英文主题词】:Augerelectronspectroscopy;Chemicalanalysisandtesting;Definition;Definitions;Depthmeasurement;Depthprofile;Finishes;Quantitativeanalysis;Spectroscopy;Sputtering;Surfacechemistry;Surfaces;X-rayspectrometry
【摘要】:ThisTechnicalReportdescribesamethodfordeterminingion-sputteringratesfordepthprofilingmeasurementswithAugerelectronspectroscopy(AES)andX-rayphotoelectronspectroscopy(XPS)wherethespecimenision-sputteredoveraregionwithanareabetween0,4mm2and3,0mm2.ThisTechnicalReportisapplicableonlytoalaterallyhomogeneousbulkorsingle-layeredmaterialwheretheion-sputteringrateisdeterminedfromthesputtereddepth,asmeasuredbyamechanicalstylusprofilometer,andsputteringtime.ThisTechnicalReportprovidesamethodtoconverttheion-sputteringtimescaletosputtereddepthinadepthprofilebyassumingaconstantsputteringvelocity.Thismethodhasnotbeendesignedfor,ortestedusing,ascanningprobemicroscopesystem.Itisnotapplicabletothecasewherethesputteredareaislessthan0,4mm2orwherethesputter-inducedsurfaceroughnessissignificantcomparedwiththesputtereddepthtobemeasured
【中国标准分类号】:A43
【国际标准分类号】:71_040_40
【页数】:24P.;A4
【正文语种】:英语
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